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Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President And Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, August 30, 2011: US08008743 (2 worldwide citation)

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


2
Dr. Jill S. Becker
Roy Gerald Gordon, Jill S Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and Fellows of Harvard College, Wilmer Cutler Pickering Hale and Dorr, September 17, 2013: US08536070

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


3
Dr. Jill S. Becker
Roy G GORDON, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. November 17, 2011: US20110281417-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


4
Dr. Jill S. Becker
Roy G Gordon, Jill Becker, Dennis Hausmann: Vapor deposition of silicon dioxide nanolaminates. President and fellows of Harvard College, Wilmer Cutler Pickering Hale And Dorr, May 26, 2005: US20050112282-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


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Gordon Roy G, Hausmann Dennis, Becker Jill: Vapor deposition of silicon dioxide nanolaminates. Harvard College, December 29, 2004: EP1490529-A1

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


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Gordon Roy G, Hausmann Dennis, Becker Jill: Vapor deposition of silicon dioxide nanolaminates. President And Fellows Of Harvard College, Gordon Roy G, Hausmann Dennis, Becker Jill, SCOZZAFAVA Mary Rose, October 9, 2003: WO/2003/083167

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


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Gordon Roy G, Becker Jill, Hausmann Dennis: Vapor deposition of silicon dioxide nanolaminates. Harvard College, ren zonghua, August 3, 2005: CN03809539

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


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Gordon Roy G, Hausmann Dennis, Becker Jill: Vapor deposition of silicon dioxide nanolaminates. The President And Fellows Of Harvard College, November 17, 2004: KR1020047015215

This invention relates to materials and processes for thin film deposition on solid substrates. Silica/alumina nanolaminates were deposited on heated substrates by the reaction of an aluminum-containing compound with a silanol. The nanolaminates have very uniform thickness and excellent step coverag ...


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