1
Negishi Toshio: Vapor deposition apparatus and film forming method. Ulvac Japan, April 23, 2009: JP2009-087910 (61 worldwide citation)

PROBLEM TO BE SOLVED: To accurately evaporate a necessary amount of organic material by heat to provide an organic thin film with a fine film quality.SOLUTION: In a vapor deposition apparatus, vapor generating devices 20a to 20c are connected to a discharge device 50 to supply vapor while other vapo ...


2
Toshio NEGISHI: Vapor deposition source, vapor deposition apparatus, and film-forming method. ULVAC, Kratz Quintos & Hanson, January 21, 2010: US20100015324-A1

A vapor deposition apparatus capable of forming an organic thin film having a good film quality is provided. In the vapor deposition apparatus of the present invention, a tray is disposed in an evaporation chamber, and a feed device feeds a vapor deposition material onto the tray. The tray is placed ...


3
Negishi Toshio: Vapor production device, vapor deposition apparatus and film-forming method. Ulvac Japan, April 23, 2009: JP2009-084676

PROBLEM TO BE SOLVED: To provide an apparatus which can form an organic thin film of high film quality, and to provide a film-forming method therefor.SOLUTION: A mounting surface 25 of a mounting member 22 inclines with respect to a horizontal plane. When a vapor deposition material 39 is mounted on ...