1
Vacuum System, in Particular EUV Lithography System, and Optical Element. June 15, 2017: US20170168402-A1

A vacuum system, in particular an EUV lithography system, includes: a vacuum housing, in which a vacuum environment is formed, and also at least one component (14), e.g., an optical element, having a surface (14a) which is subjected to contaminating particles in the vacuum environment. A surface str ...


2
VACUUM SYSTEM, IN PARTICULAR EUV LITHOGRAPHY SYSTEM, AND OPTICAL ELEMENT. June 27, 2019: US20190196344-A1

A vacuum system, in particular an EUV lithography system, includes: a vacuum housing (2), in which a vacuum environment (16) is formed. A surface (2a) of the vacuum housing is subjected to contaminating particles (17) in the vacuum environment. A surface structure (18) at the surface reduces adhesio ...