1
David White, Taber H Smith: Test masks for lithographic and etch processes. Praesagus, Bingham McCutchen, July 10, 2007: US07243316 (197 worldwide citation)

A mask design is generated for patterning a test wafer using a lithographic or etch process, the process is characterized based on the patterned test wafer, and a pattern-dependent model is used based on the characterization to predict characteristics of integrated circuits that are to be fabricated ...


2
David White, Taber H Smith: Test masks for lithographic and etch processes. David L Feigenbaum, Fish & Richardson PC, December 11, 2003: US20030229880-A1 (1 worldwide citation)

A mask design is generated for patterning a test wafer using a lithographic or etch process, the process is characterized based on the patterned test wafer, and a pattern-dependent model is used based on the characterization to predict characteristics of integrated circuits that are to be fabricated ...


3
David White, Taber H Smith: Test masks for lithographic and etch processes. Praesagus, Fish & Richardson P C, June 13, 2006: US07062730

A mask design is generated for patterning a test wafer using a lithographic or etch process, the process is characterized based on the patterned test wafer, and a pattern-dependent model is used based on the characterization to predict characteristics of integrated circuits that are to be fabricated ...