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Alexander I Ershov, William F Marx: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source. Cymer, Matthew Hillman, William C Cray, March 27, 2007: US07196342 (150 worldwide citation)

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove ...


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Alexander I Ershov, William F Marx, Norbert Bowering, Bjorn A M Hansson, Oleh Khodykin, Igor V Fomenkov: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source. Cymer, Matthew K Hillman, June 8, 2010: US07732793 (6 worldwide citation)

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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Ershov Alexander I, Marx William F, Bowering Norbert R, Hansson Bjorn A M, Khodykin Oleh, Fomenkov Igor V, Partlo William N: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source. Cymer, Ershov Alexander I, Marx William F, Bowering Norbert R, Hansson Bjorn A M, Khodykin Oleh, Fomenkov Igor V, Partlo William N, CRAY William C, February 23, 2006: WO/2006/020080 (1 worldwide citation)

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


4
Ershov Alexander I, Marx William F, Bowering Norbert R, Hansson Bjorn A M, Khodykin Oleh, Fomenkov Igor V, Partlo William N: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source. Cymer, May 2, 2007: EP1779410-A2

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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Alexander I Ershov, William F Marx, Norbert Bowering, Bjorn A M Hansson, Oleh Khodykin, Igor V Fomenkov: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source. Cymer, Matthew K Hillman, Cymer Legal Dept, August 16, 2007: US20070187627-A1

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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Alexander I Ershov, William F Marx, Norbert R Bowering, Bjorn A M Hansson, Oleh Khodykin, Igor V Fomenkov, William N Partlo: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source. Cymer, Matthew K Hillman, Cymer, December 8, 2005: US20050269529-A1

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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Ershov Alexander I, Marx William F, Bowering Norbert R, Hansson Bjorn A M, Khodykin Oleh: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source. Cymer, April 16, 2006: TW200612208

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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Ershov Alexander I, Marx William F, Bowering Norbert R, Hansson Bjorn A M, Khodykin Oleh, Fomenkov Igor V, Partlo William N: Systems and methods for reducing the influence of plasma-generated debris on the internal components of an euv light source. Cymer, April 9, 2007: KR1020077000552

Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove de ...


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