1
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein & Fox P L L C, June 14, 2005: US06906783 (37 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


2
Santiago del Puerto, Eric R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System for using a two part cover for protecting a reticle. ASML Holding, Sterne Kessler Goldstein and Fox P L L C, December 4, 2007: US07304720 (16 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


3
Del Puerto Santiago, Loopstra Eric R, Massar Andrew, Kish Duane P, Alikhan Abdullah, Olson Woodrow J, Feroce Jonathan H: System and method for using two-part cover for protecting reticle to protect reticle from contaminants without substantially reducing quality of euv light transmitting system. Asml Holding, March 24, 2006: KR1020060019943

PURPOSE: A system for using a two-part cover for protecting a reticle is provided to protect a reticle from contaminants without substantially reducing the quality of EUV light transmitting system by maintaining a frame coupled to the reticle during an exposure process wherein a cover is coupled to ...