1
Del Puerto Santiago, Massar Andrew, Alikhan Abdullah, Feroce Jonathan H, Loopstra Eric R, Kish Duane P, Olson Woodrow J: System and method for using a two part cover for protecting a reticle. Asml Netherlands, September 3, 2003: EP1341042-A2 (7 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


2
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, November 27, 2003: US20030218728-A1 (1 worldwide citation)

A system and method are used to protect a mask from being contaminated by airborne particles. They include coupling a reticle and a cover to protect the reticle. The cover includes a frame and a movable panel that moves to allow direct access of light to the reticle during an exposure process. The r ...


3

4

5

6

7

8
Santiago del Puerto, Erik R Loopstra, Andrew Massar, Duane P Kish, Abdullah Alikhan, Woodrow J Olson, Jonathan H Feroce: System and method for using a two part cover for protecting a reticle. ASML Netherlands, Sterne Kessler Goldstein & Fox Pllc, December 11, 2003: US20030227605-A1

A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or b ...


9
Del Puerto Santiago, Loopstra Erik R, Massar Andrew, Kish Duane P, Alikhan Abdullah, Olson Woodrow J, Feroce Jonathan H: System and method for using a two part cover for protecting a reticle. Asml Netherlands, wangbei bei, January 16, 2008: CN200710102348

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...


10
Del Puerto Santiago, Loopstra Erik R, Massar Andrew, Kish Duane P, Alikhan Abdullah, Olson Woodrow J, Feroce Jonathan H: System and method for using a two part cover for protecting a reticle. Asml Netherlands, wangbei bei, January 16, 2008: CN200710102349

Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can b ...