1
Tetsuo Taniguchi, Saburo Kamiya: Stage device and exposure apparatus. Nikon Corporation, Oliff & Berridge, May 24, 2005: US06897963 (223 worldwide citation)

A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage moves from the position where the ...


2
Shiwen Li: Stage device and exposure apparatus. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 9, 2002: US06417914 (131 worldwide citation)

The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move th ...


3
Shigeto Kamata, Toshio Matsuki: Linear motor, and stage device and exposure apparatus provided with the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, July 4, 2000: US06084319 (38 worldwide citation)

A linear motor including a coil and a jacket which covers the coil and allows a cooling medium to be supplied through a space in the jacket. The jacket is made of an insulating material, such as a ceramic material or a high-polymer resinous material. The linear motor can include a reinforcing member ...


4
Makinouchi Susumu: Encoder system, stage device, and exposure apparatus. Nikon, April 12, 2007: JP2007-093546 (33 worldwide citation)

PROBLEM TO BE SOLVED: To accurately measure a position in an encoder system, a stage device and exposure apparatus.SOLUTION: The exposure apparatus 100 is provided with the encoder system 16 having encoders 17Y1, 17Y2 and 17X in order to measure positional information of a reticle stage RST. A laser ...


5
Taniguchi Tetsuo, Kamiya Saburo: Stage device and exposure apparatus. Nippon Kogaku, October 4, 2000: EP1041357-A1 (27 worldwide citation)

A stage device suitable for exposure apparatus used to produce semiconductor devices, is movable in an area wider than the measurement area of interferometer for position measurement, and is capable of measuring the position with high precision. When a movable stage (WST) moves from the position whe ...


6
Toshihide Kikuchi, Masahiro Totsu, Kazuya Ono, Yutaka Uda: Linear motor device, stage device, and exposure apparatus. Nikon Corporation, Oblon Spivak McClelland Maier & Neustadt P C, July 8, 2003: US06590355 (26 worldwide citation)

Disclosed is a linear motor device provided with a movable member, a stator having coils, and a control system for powering selected coils among the coils in accordance with a position of the movable member. The control system powers only the minimum number of coils contributing to the generation of ...


7
Andrew J Hazelton, Thomas W Novak: Stage device, and exposure apparatus with linear motor having polygonal shaped coil units. Nikon Corporation, Oliff & Berridge, April 16, 2002: US06373153 (24 worldwide citation)

The exposure apparatus of the present invention for forming a specified image on a substrate mounted on a substrate stage, has a linear motor as a part of a driving source for driving said substrate stage. The linear motor comprises: a magnet track; and a motor coil operating in cooperation with sai ...


8
Nobushige Korenaga: Stage device and exposure apparatus using the same. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 23, 2001: US06177978 (23 worldwide citation)

A scanning exposure apparatus having a stage device. The apparatus includes a reticle stage for moving a reticle having a pattern, a wafer stage for moving a wafer in a timed relation with the movement of the reticle stage and an optical system for projecting the pattern of the reticle onto the wafe ...


9
Keiichi Tanaka: Stage device and exposure apparatus. Nikon Corporation, Oliff & Berridge, January 21, 2003: US06509957 (22 worldwide citation)

A stage device includes a first stationary member, a second stationary member, a moving member and positioning devices. The first stationary member extends in a first direction. The second stationary member extends in the first direction and is spaced apart from the first stationary member in a seco ...


10
Yasushi Yoda: Stage device and exposure apparatus, and method of manufacturing a device. Nikon Corporation, Oliff & Berridge, November 25, 2003: US06654100 (13 worldwide citation)

A stage device includes a switching device that switches between a first state in which a stage can move along a first movement reference surface, and a second state in which the stage can move along a second movement reference surface. The stage device can have first and second stages, and the swit ...