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Andrew Nguyen, Kartik Ramaswamy, Srinivas Nemani, Bradley Howard, Yogananda Sarode Vishwanath: Semiconductor system assemblies and methods of operation. Applied Materials, Kilpatrick Townsend & Stockton, March 15, 2016: US09287095 (54 worldwide citation)

An exemplary semiconductor processing system may include a remote plasma source coupled with a processing chamber having a top plate. An inlet assembly may be used to couple the remote plasma source with the top plate and may include a mounting assembly, which in embodiments may include at least two ...


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SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION. Applied Materials, June 18, 2015: US20150170879-A1

An exemplary semiconductor processing system may include a high-frequency electrical source that has an outlet plug. The system may include a processing chamber having a top plate, and an inlet assembly coupled with the top plate. The inlet assembly may include an electrode defining an aperture at a ...


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SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION. Applied Materials, June 18, 2015: US20150170924-A1

An exemplary semiconductor processing system may include a remote plasma source coupled with a processing chamber having a top plate. An inlet assembly may be used to couple the remote plasma source with the top plate and may include a mounting assembly, which in embodiments may include at least two ...


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SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION. Applied Materials, June 18, 2015: US20150170943-A1

An exemplary semiconductor processing system may include a processing chamber and a first plasma source. The first plasma source may utilize a first electrode positioned externally to the processing chamber, and the first plasma source may be configured to generate a first plasma. The processing sys ...


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SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION. Applied Materials, July 28, 2016: US20160217981-A1

An exemplary semiconductor processing system may include a remote plasma source coupled with a processing chamber having a top plate. An inlet assembly may be used to couple the remote plasma source with the top plate and may include a mounting assembly, which in embodiments may include at least two ...