1
Manfred Rietzler, Francisco Martinez de Velasco Cortina: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Neology, Baker & McKenzie, April 25, 2006: US07034688 (14 worldwide citation)

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation fo devices thereby are provided. The method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


2
Francisco Martinez De Velasco Cortina, Manfred Rietzler: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Neology, Baker & McKenzie, December 9, 2008: US07463154 (8 worldwide citation)

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation of devices thereby are provided. Th method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


3
Martinez de Velasco Cortina Fr, Riezler Manfred: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Neology, August 9, 2006: EP1688868-A2 (1 worldwide citation)

A method is disclosed of making a radio-frequency (RF) identification device comprising: forming an antenna on a base layer; and mounting a radio frequency (RF) chip on the base layer in electrical communication with the antenna to form an RF transponder; the antenna being formed by selective de-met ...


4
Martinez de Velasco Cortina Fr, Riezler Manfred: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Bnc Ip Switzerland, April 7, 2004: EP1405278-A2

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation of devices thereby are provided. Th method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


5
Martinez de Velasco Cortina Fr, Riezler Manfred: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Neology, September 6, 2006: EP1699276-A2

A method is disclosed of forming a pattern in a metallized region, the method comprising: transferring a metal etching solution to portions of an exposed surface of the metallized region using a printing process; allowing the etching solution to react with the metallized region to selectively demeta ...


6
Francisco Martinez De Velasco, Manfred Rietzler: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Paul Hastings Janofsky & Walker, March 3, 2005: US20050046573-A1

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation of devices thereby are provided. Th method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


7
Manfred Rietzler, Francisco Martinez de Velasco Cortina: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Piper Rudnick, Supervisor Patent Prosecution Services, October 31, 2002: US20020160786-A1

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation fo devices thereby are provided. The method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


8
Manfred Rietzler, Francisco Martinez de Velasco Cortina: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Neology, Baker & Mckenzie, August 24, 2006: US20060187063-A1

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation of devices thereby are provided. The method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...


9
Martinez de Velasco, Cortina Francisco, Rietzler Manfred: Selective metal removal process for metallized retro-reflective and holographic films and radio frequency devices made therewith. Bnc Ip Switzerland, Martinez de Velasco, Cortina Francisco, Rietzler Manfred, November 7, 2002: WO/2002/089338

A method for selectively removing metal from a metallized substrate (e.g., a metallized polymer film) and the formation of devices thereby are provided. The method involves selectively exposing the metallized surface to a demetallizing (i.e., an oxidizing) chemical solution. The metallized layer can ...



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