1
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Omura Yasuhiro, Ikezawa Hironori, Williamson David M, HASEGAWA Yoshiki, March 4, 2004: WO/2004/019128 (891 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


2
Yasuhiro Omura, Hironori Ikezawa, David M Williamson: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, April 22, 2008: US07362508 (33 worldwide citation)

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


3
Yasuhiro Omura, Hironori Ikezawa: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, August 25, 2009: US07580197 (31 worldwide citation)

A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically t ...


4
Yasuhiro Omura, Hironori Ikezawa: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, March 30, 2010: US07688517 (13 worldwide citation)

An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical ...


5
Yasuhiro Omura, Hironori Ikezawa: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, October 27, 2009: US07609455 (13 worldwide citation)

A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate using a projection system and has a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projecti ...


6
Yasuhiro Omura, Hironori Ikezawa: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, November 17, 2009: US07619827 (12 worldwide citation)

A projection lens of a microlithographic projection exposure apparatus includes a final lens element and a terminating element having no overall refractive power that is positioned between, but spaced apart from, the final lens element and an image plane of the projection lens. The image plane is ad ...


7
Yasuhiro Omura, Hironori Ikezawa, David M Williamson: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, April 20, 2010: US07701640 (12 worldwide citation)

An immersion optical system includes a plurality of lenses disposed along a light beam path of the immersion optical system. The plurality of lenses include a liquid immerged lens which is contactable with a liquid layer. An optically conjugate point of an object surface is formed in the light beam ...


8
Yasuhiro Omura, Hironori Ikezawa: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, June 23, 2009: US07551362 (12 worldwide citation)

An immersion optical system includes a liquid immerged optical element having an optical surface which is contactable with a liquid, a convex surface, and an optical axis. A side surface of the liquid immerged optical element is inclined with respect to the optical axis.


9
Omura Yasuhiro, Ikezawa Hironori, Williamson David M: Projection optical system and method for photolithography and exposure apparatus and method using same. Nippon Kogaku, May 25, 2005: EP1532489-A2

Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path befo ...


10
Yasuhiro Omura, Hironori Ikezawa, David M Williamson: Projection optical system and method for photolithography and exposure apparatus and method using same. Nikon Corporation, Oliff & Berridge, February 28, 2008: US20080049306-A1

An optical system for ultraviolet light includes a plurality of optical elements made of a material transparent to ultraviolet light. At least two of the optical elements are utilized for forming at least one liquid lens group that has a first delimiting optical element, a second delimiting optical ...