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Beder Susanne, Singer Wolfgang: Projection objective having a high aperture and a planar end surface. Carl Zeiss Smt, Beder Susanne, Singer Wolfgang, PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart, June 30, 2005: WO/2005/059617 (422 worldwide citation)

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Susanne Beder, Wolfgang Singer, Karl Heinz Schuster: Projection objective having a high aperture and a planar end surface. Sughrue Mion PLLC, December 16, 2008: US07466489 (7 worldwide citation)

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Beder Susanne, Singer Wolfgang, Schuster Karl Heinz: Projection objective having a high aperture and a planar end surface. Carl Zeiss Smt, Beder Susanne, Singer Wolfgang, Schuster Karl Heinz, PATENTANWÄLTE RUFF WILHELM BEIER DAUSTER Kronenstrasse 30 70174 Stuttgart, December 21, 2006: WO/2006/133801 (2 worldwide citation)

A projection objective for imaging a pattern provided in an object plane (OP) of the projection objective onto an image plane (IP) of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wave ...


4
Susanne Beder, Wolfgang Singer, Karl Heinz Schuster: Projection objective having a high aperture and a planar end surface. Carl Zeiss SMT, Sughrue Mion PLLC, August 24, 2010: US07782538

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Beder Susanne, Singer Wolfgang, Schuster Karl Heinz: Projection objective having a high aperture and a planar end surface. Zeiss Carl Smt, zhangxue mei liuchun yuan, August 13, 2008: CN200680029692

A projection objective for imaging a pattern provided in an object plane (OP) of the projection objective onto an image plane (IP) of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wave ...


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Beder Susanne, Singer Wolfgang, Schuster Karl Heinz: Projection objective having a high aperture and a planar end surface. Zeiss Carl Smt, February 27, 2008: EP1891481-A1

A projection objective for imaging a pattern provided in an object plane (OP) of the projection objective onto an image plane (IP) of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wave ...


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Beder Susanne, Singer Wolfgang: Projection objective having a high aperture and a planar end surface. Zeiss Carl Smt, September 6, 2006: EP1697798-A2

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Susanne BEDER, Wolfgang Singer, Karl Heinz Schuster: Projection objective having a high aperture and a planar end surface. Carl Zeiss Smt, Sughrue Mion Pllc, March 5, 2009: US20090059385-A1

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Susanne Beder, Wolfgang Singer, Karl Heinz Schuster: Projection objective having a high aperture and a planar end surface. Carl Zeiss Smt, Sughrue Mion Pllc, January 19, 2006: US20060012885-A1

A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of ...


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Beder Susanne, Singer Wolfgang: Projection objective having a high aperture and a planar end surface. Zeiss Carl Smt, cheng tianzheng zhang zhicheng, January 10, 2007: CN200480037372

age plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index m ...