1
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


2
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, June 11, 2002: US06404482 (89 worldwide citation)

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming be ...


3
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Oliff & Berridge, April 3, 2001: US06211944 (84 worldwide citation)

A projection exposure apparatus and method that includes an illumination system and a projection system. The illumination system may include a plurality of optical integrators that form different secondary light sources. The illumination system illuminates the pattern with light from a secondary lig ...


4
Shiraishi Naomasa: Projection exposure method and apparatus.. Nippon Kogaku, May 20, 1992: EP0486316-A2 (72 worldwide citation)

A projection exposure apparatus consists of: an illumination optical system, including a light source, for irradiating a mask; a projection optical system for projecting a hyperfine pattern image on a substrate; an optical integrator for illuminating the mask in a homogeneous illuminance distributio ...


5
Tetsuo Taniguchi: Projection exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, February 24, 1998: US05721608 (69 worldwide citation)

A projection exposure apparatus has an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with light from a light source, a projection optical system for forming an image of the pattern of the mask on a photosensitive substrate, a mask stage for holding ...


6
Hiroyuki Suzuki, Osamu Furukawa: Projection exposure method and apparatus with focus detection. Nikon Corporation, Shapiro & Shapiro, May 2, 1995: US05412214 (64 worldwide citation)

A projection exposure method and apparatus are disclosed, which can perform a focusing operation with respect to a partly omitted shot exposed at a peripheral portion of a photosensitive substrate such as a wafer. In the projection exposure method and apparatus, when a prohibition band having a pred ...


7
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, November 14, 1995: US05467166 (59 worldwide citation)

In order to effect projection exposure at a great depth of focus without spoiling transfer fidelity even for a plurality of isolated patterns relatively close to one another, provision is made of a coherence reducing member CCM for reducing the coherency between imaging light in a central circular t ...


8
Kenji Nishi: Projection exposure method and apparatus. Nikon Corporation, Oliff & Berridge, July 8, 2003: US06590636 (51 worldwide citation)

A scanning exposure method moves a mask and a substrate synchronously. A first mask and a second mask are provided for a mask stage. The mask stage has a reflective surface extending in a scanning direction, and the first and second masks are arranged along the scanning direction. Surface curvature ...


9
Yasuhiro Omura: Projection exposure methods and apparatus, and projection optical systems. Nikon Corporation, Oliff & Berridge, August 12, 2003: US06606144 (50 worldwide citation)

A projection exposure method and apparatus and method of fabricating a projection exposure apparatus that has an illumination optical system for supplying exposure light of a wavelength of not more than 200 nm to the projection master and a projection optical system for forming an image of a pattern ...


10
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, October 30, 2001: US06310679 (45 worldwide citation)

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming be ...