1
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, February 23, 1988: US04726963 (58 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is rea ...


2
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, March 1, 1988: US04728528 (35 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and a halogen and an active species (B) formed from a chemical substance for film formation which is reacti ...


3
Nobuo Mikoshiba, Kazuo Tsubouchi, Kazuya Masu: Process for forming deposited film by use of alkyl aluminum hydride. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 12, 1993: US05179042 (30 worldwide citation)

A process for forming an Al film of good quality according to the CVD method utilizing the reaction between alkyl aluminum hydride and hydrogen, which is an excellent deposited film formation process also capable of selective deposition of A1.


4
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 5, 1988: US04717585 (29 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing carbon and a halogen and an active species (B) formed from a chemical substance for film formation which is reacti ...


5
Nobuo Mikoshiba, Tadahiro Ohmi, Kazuo Tsubouchi, Kazuya Masu, Nobumasa Suzuki: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 19, 1998: US05753320 (29 worldwide citation)

A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, supplying the excited species onto the surface of ...


6
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 5, 1988: US04717586 (28 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space for forming a deposited film on a substrate an activated species (A) formed by decomposition of a compound containing silicon and a halogen and an activated species (B) formed from a germanium containing compound ...


7
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 31, 1989: US04801468 (27 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is rea ...


8
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, April 4, 1989: US04818563 (27 worldwide citation)

A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is rea ...


9
Ryuji Okamura, Kazuyoshi Akiyama, Hitoshi Murayama, Koji Hitsuishi, Satoshi Kojima, Hirokazu Ohtoshi, Masaaki Yamamura: Process for forming deposited film for light-receiving member, light-received member produced by the process deposited film forming apparatus, and method for cleaning deposited film forming apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 6, 1998: US05817181 (24 worldwide citation)

A process for producing a light-receiving member comprising a substrate and provided thereon a blocking layer and a photoconductive layer each comprised of a non-monocrystalline material is disclosed in which the blocking layer is comprised of a non-monocrystalline material comprising silicon atoms ...


10
Shunichi Ishihara, Shigeru Ohno, Masahiro Kanai, Shunri Oda, Isamu Shimizu: Process for forming deposited film. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, October 18, 1988: US04778692 (24 worldwide citation)

A process for forming a deposited film, which comprises introducing into a film forming space for formation of a deposited film on a substrate an active species (A) formed by decomposition of a compound containing silicon and a halogen and an active species (B) formed from a germanium containing com ...