1
W Thomas Novak, Zahirudeen Premji, Uday G Nayak, Akimitsu Ebihara: Precision motion stage with single guide beam and follower stage. Nikon Precision, Norman R Klivans, Skjerven Morrill MacPherson Franklin & Friel, April 29, 1997: US05623853 (414 worldwide citation)

An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in ...


2
W Thomas Novak, Zahirudeen Premji, Uday G Nayak, Akimitsu Ebihara: Precision motion stage with single guide beam and follower stage. Nikon Corporation, Debra A Chun, December 7, 1999: US05996437 (29 worldwide citation)

An XY stage for precision movement for use in aligning a wafer in a microlithography system. A main stage supporting the wafer straddles a movable beam that is magnetically driven in a first linear direction in the XY plane. A follower stage, mechanically independent of the main stage, also moves in ...