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Christopher H Galfo, Ashok L Nalamwar: Plasma passivation technique for the prevention of post-etch corrosion of plasma-etched aluminum films. Fairchild Camera & Instrument, Paul J Winters, Theodore Scott Park, Michael J Pollock, April 20, 1982: US04325984 (27 worldwide citation)

A method for preventing the post-etch corrosion of aluminum or aluminum alloy film which has been etched utilizing chlorinated plasma wherein the etched film is exposed to fluorinated plasma.


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Nalamwar Ashok L, Galfo Christopher H: Procede de passivation permettant dempecher la corrosion des pellicules daluminium traitees au plasma, Plasma passivation technique for the prevention of post etch corrosion of plasma-etched aluminum films. Fairchild Camera And Instrument Corporation, SMART & BIGGAR, August 2, 1983: CA1151106

F-1466 PLASMA PASSIVATION TECHNIQUE FOR THEPREVENTION OF POST-ETCH CORROSION OF PLASMA-ETCHED ALUMINUM FILMS ByChristopher H. Galfo andAshok L. Nalamwar Abstract A method for preventing the post-etch corrosion ofaluminum or aluminum alloy film which has been etchedutilizing chlorinated plasma wherei ...