1
Avi Tepman, Howard Grunes, Dana Andrews: Physical vapor deposition clamping mechanism and heater/cooler. Applied Materials, John A Frazzini, July 20, 1993: US05228501 (194 worldwide citation)

A clamping ring and temperature regulated platen for clamping a wafer to the platen and regulating the temperature of the wafer. The force of the clamping ring against the wafer is produced by the weight of the clamping ring. A roof shields all but a few contact regions of the interface between the ...


2
Tepman Avi, Grunes Howard, Andrews Dana: Physical vapor deposition clamping mechanism and heater/cooler.. Applied Materials, October 23, 1991: EP0452779-A2 (22 worldwide citation)

A clamping ring (122) and temperature regulated platen (110) for clamping a wafer (15) to the platen (110) and regulating the temperature of the wafer (15). The force of the clamping ring (122) against the wafer is produced by the weight of the clamping ring (122) only. A roof shields all but a few ...