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Jongwook Kye, Carl P Babcock, Christopher F Lyons: Pellicle for a lithographic lens. Advanced Micro Devices, Renner Otto Boisselle & Sklar, June 14, 2005: US06906777 (3 worldwide citation)

A method and apparatus for preventing contamination in a lithographic apparatus including a projection system, including providing the lithographic apparatus including the projection system for imaging an irradiated portion of a mask onto a target portion of a substrate and placing a pellicle over a ...


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Kye Jongwook, Babcock Carl P, Lyons Christopher F: Pellicle for a lithographic lens. Advanced Micro Devices, Kye Jongwook, Babcock Carl P, Lyons Christopher F, DRAKE Paul S, September 15, 2005: WO/2005/085956 (2 worldwide citation)

Disclosed are a method and apparatus for preventing contamination in a lithographic apparatus (10) including a projection system (24). The lithographic apparatus (10) images an irradiated portion of a mask (22) onto a target portion (40) of a substrate (28). A pellicle (32, 36) is placed with respec ...


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