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Akihiro Takanashi, Tatsuo Harada, Masamoto Akeyama, Yataro Kondo, Toshiei Kurosaki, Shinji Kuniyoshi, Sumio Hosaka, Yoshio Kawamura: Pattern forming apparatus. Hitachi, Antonelli Terry & Wands, November 6, 1984: US04480910 (907 worldwide citation)

There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at ...


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Masamoto Akeyama, Yoshifumi Tomita, Saburo Nonogaki: Pattern forming method and pattern forming apparatus using exposures in a liquid. Hitachi, Antonelli Terry & Wands, August 2, 1983: US04396705 (398 worldwide citation)

A pattern forming method comprising a step of disposing a substrate with a coated film of photosensitive composition and a mask having a predetermined pattern in a first liquid which does not dissolve said coated film of photosensitive composition, and a step of exposing said coated film to light th ...


3
Shingo Okushima, Junichi Seki: Pattern forming method and pattern forming apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, January 4, 2011: US07862761 (120 worldwide citation)

A pattern forming method for forming a pattern on a pattern forming material on a substrate by using an imprint pattern provided to a mold is constituted by preparing a substrate having thereon a pattern forming area, disposing the pattern forming material placed in an uncured state in the pattern f ...


4
Yuichi Tachikawa, Kazumichi Yasui, Kiyoshi Nakaso, Kiyoshi Hattori, Tsugiyuki Okuya, Makoto Mita: Position measurement apparatus and method and pattern forming apparatus and writing method. NuFlare Technology, Oblon Spivak McClelland Maier & Neustadt L, December 29, 2009: US07640142 (75 worldwide citation)

A position measurement apparatus includes a movable stage structure, a measurement unit using a laser to measure a moved position of the stage and to output a corresponding measured value, a first filter configured to attenuate a first component of a certain frequency region of the measured value ou ...


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Takayuki Yagi, Toshiyuki Komatsu, Yasue Sato, Shinichi Kawate: Apparatus for preparing a semiconductor device, photo treatment apparatus, pattern forming apparatus and fabrication apparatus. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 9, 1995: US05413664 (38 worldwide citation)

A process for forming an etching pattern, which includes selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having an etching resistance at ...


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Yuichi Shibazaki: Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus, and device manufacturing method. Nikon Corporation, Oliff & Berridge, November 23, 2010: US07839485 (25 worldwide citation)

Positional information of a movable body in a Y-axis direction is measured using an interferometer and an encoder whose short-term stability of measurement values excels when compared with the interferometer, and based on the measurement results, a predetermined calibration operation for obtaining c ...


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Takako Yamaguchi, Ryo Kuroda: Pattern forming apparatus and pattern forming method. Canon Kabushiki Kaisha, Fitzpatrick Cella Harper & Scinto, May 6, 2003: US06559926 (25 worldwide citation)

A pattern forming apparatus for forming a pattern on a substrate includes a first exposure section capable of conducting pattern exposure for a predetermined line width, a second exposure section for conducting pattern exposure for a line width greater than the predetermined linewidth of the first e ...


9
Maynard R Euverard, James J Diver, Thomas C Schneider: Pattern forming apparatus and product orienter therefor. Velten & Pulver, Emrich & Dithmar, June 11, 1985: US04522292 (24 worldwide citation)

An in-line pattern forming apparatus includes a windowed endless roller conveyor disposed in a longitudinal system path for sequentially receiving sets of articles. A friction shoe shifts the set of articles through the conveyor window to an underlying turntable which is rotatable for selectively re ...


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Shibazaki Yuichi: (Ja) パターン形成装置、マーク検出装置、露光装置、パターン形成方法、露光方法及びデバイス製造方法, (En) Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method. Nikon Corporation, Shibazaki Yuichi, TATEISHI Atsuji, August 30, 2007: WO/2007/097379 (24 worldwide citation)

(EN) The plane position information of the front plane of a wafer (W) is detected at a plurality of detecting points set at prescribed intervals in an X axis direction by multiple point AF systems (90a, 90b), while a wafer stage (WST) is linearly shifting in a Y axis direction. Marks at different po ...