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Bruce W Smith: Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. ASML Masktools, McDermott Will & Emery, April 19, 2005: US06881523 (93 worldwide citation)

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axi ...


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Smith Bruce W: An optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. Asml Masktools, September 18, 2002: EP1241525-A2 (5 worldwide citation)

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axi ...


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Bruce W Smith: Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. Mcdermott Will & Emery, December 19, 2002: US20020192570-A1 (1 worldwide citation)

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axi ...


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Smith Bruce W: An optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. Asml Masktools, January 11, 2004: TW571571

A photolithography mask for optically transferring a pattern formed in said mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, where each of the plurality of resolvable features has a longitudinal axi ...


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Smith Bruce W: Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. Asml Masktools, December 13, 2002: JP2002-357892

PROBLEM TO BE SOLVED: To provide a photolithography mask for optically transferring a pattern formed in the mask onto a substrate and negating an optical proximity effect. SOLUTION: The mask contains a plurality of resolvable features to be printed on a substrate, each of the plurality of resolvable ...


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Smith Bruce W: Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features. Asml Masktools, September 23, 2002: KR1020020013506

PURPOSE: A method of forming a photolithography mask having OPC assist features is provided which allows for improved design flexibility and, in particular, improved control over the amount of space intensity reduction. CONSTITUTION: A mask layout represents a two dimensional application of mainline ...


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