1
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Berk, Daniel P Morris, April 22, 2008: US07361444 (9 worldwide citation)

Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist st ...


2
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, May 4, 2010: US07709177 (5 worldwide citation)

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


3
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. International Business Machines Corporation, Thomas A Beck, Daniel P Morris, June 15, 2010: US07736833

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


4
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles Latulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124650-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...


5
Katherina Babich
Marie Angelopoulos, Katherina E Babich, Douglas Charles LaTulipe, Qinghuang Lin, David R Medeiros, Wayne Martin Moreau, Karen E Petrillo, John P Simons: Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof. Thomas A Beck, May 29, 2008: US20080124649-A1

Multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibi ...