1
Schuster Karl Heinz, Clauss Wilfried: Microlithography projection objective with crystal lens. Carl Zeiss Smt, Schuster Karl Heinz, Clauss Wilfried, M√úLLER RISSMANN Werner, June 30, 2005: WO/2005/059618 (409 worldwide citation)

Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KC ...


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Karl Heinz Schuster, Wilfried Clauss: Microlithography projection objective with crystal lens. Carl Zeiss SMT, Darby & Darby P C, July 13, 2010: US07755839

Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KC ...


3
Karl Heinz Schuster: Microlithography projection objective with crystal lens. Darby & Darby PC, April 26, 2007: US20070091451-A1

Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KC ...