1
Torbjörn Sandström: Methods and systems for improved boundary contrast. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, January 2, 2007: US07158280 (15 worldwide citation)

The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integ ...


2
Torbjörn Sandström: Methods and systems for improved boundary contrast. Micronic Laser Systems, Ernest J Beffel Jr, Haynes Beffel & Wolfeld, September 12, 2006: US07106490 (12 worldwide citation)

The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integ ...


3
Torbjorn Sandstrom: Methods and systems for improved boundary contrast. Micronic Laser Systems, Haynes Beffel & Wolfeld, March 18, 2004: US20040053143-A1 (1 worldwide citation)

The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integ ...


4
Sandström Torbjörn: Methods and systems for improved boundary contrast. Micronic Laser Systems, MICRONIC LASER SYSTEMS, April 15, 2004: WO/2004/031831 (1 worldwide citation)

The present invention includes relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic mas ...


5
Sandstroem Torbjoern: Methods and systems for improved boundary contrast. Micronic Laser Systems, January 29, 2003: EP1546788-A1

The present invention includes relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic mas ...


6
Torbjorn Sandstrom: Methods and systems for improved boundary contrast. Micronic Laser Systems, Haynes Beffel & Wolfeld, April 13, 2006: US20060077506-A1

The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integ ...


7
Sandstrom Torbjorn: Methods and systems for improved boundary contrast. Micronic Laser Systems, ma gaobeng yang wu, October 26, 2005: CN03823643

The present invention relates to methods and systems that embellish corner features (inside and outside) under process control to correct for optical proximity and other effects in generating patterns on workpieces. Workpieces include lithographic masks and integrated circuits produced by direct wri ...


8
Sandstrom Torbjorn: Methods and systems for improved boundary contrast. Micronic Laser Systems, July 5, 2005: KR1020057005456

The present invention includes relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic mas ...