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Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang: Method for depositing an amorphous carbon layer. Applied Materials, Moser Patterson and Sheridan, June 3, 2003: US06573030 (499 worldwide citation)

A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integ ...


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Deenesh Padhi, Hyoung Chan Ha, Sudha Rathi, Derek R Witty, Chiu Chan, Sohyun Park, Ganesh Balasubramanian, Karthik Janakiraman, Martin Jay Seamons, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M Saad: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, Patterson & Sheridan, January 11, 2011: US07867578 (3 worldwide citation)

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


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Deenesh Padhi, Hyoung Chan Ha, Sudha Rathi, Derek R Witty, Chiu Chan, Sohyun Park, Ganesh Balasubramanian, Karthik Janakiraman, Martin Jay Seamons, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M Saad: Method for depositing an amorphous carbon film with improved density and step coverage. Patterson & Sheridan Appm Tx, June 26, 2008: US20080153311-A1

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


4
Deenesh Padhi, Hyoung Chan Ha, Sudha Rathi, Derek R Wtty, Chiu Chan, Sohyun Park, Ganesh Balasubramanian, Karthik Janakiraman, Martin Jay Seamons, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M Saad: Method For Depositing an Amorphous Carbon Film with Improved Density and Step Coverage. Patterson & Sheridan, January 3, 2008: US20080003824-A1

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


5
Deenesh Padhi, Hyoung Chan Ha, Sudha Rathi, Derek R Witty, Chiu Chan, Sohyun Park, Ganesh Balasubramanian, Karthik Janakiraman, Martin Jay Seamons, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M Saad: Method for depositing an amorphous carbon film with improved density and step coverage. May 5, 2011: US20110104400-A1

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


6
Deenesh Padhi, Hyoung Chan Ha, Sudha Rathi, Derek R Witty, Chiu Chan, Sohyun Park, Ganesh Balasubramanian, Karthik Janakiraman, Martin Jay Seamons, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M Saad: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, August 16, 2012: US20120208373-A1

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


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Padhi Deenesh, Ha Hyoung Chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, Padhi Deenesh, Ha Hyoung Chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem, PATTERSON B Todd, January 3, 2008: WO/2008/002844

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


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Padhi Deenesh, Ha Hyoung Chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, Padhi Deenesh, Ha Hyoung Chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem, PATTERSON B Toddet al, September 11, 2009: WO/2009/111395

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


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Padhi Deenesh, Ha Hyoung chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, Lu Jia, July 8, 2009: CN200780024531

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...


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Padhi Deenesh, Ha Hyoung chan, Rathi Sudha, Witty Derek R, Chan Chiu, Park Sohyun, Balasubramanian Ganesh, Janakiraman Karthik, Seamons Martin Jay, Sivaramakrishnan Visweswaren, Kim Bok Hoen, M Saad Hichem: Method for depositing an amorphous carbon film with improved density and step coverage. Applied Materials, xu jinguo zhong qiang, February 23, 2011: CN200980111063

A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The ...