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Nicolas Bailey Cobb: Method and apparatus for submicron IC design using edge fragment tagging to correct edge placement distortion. Columbia IP Law Group PC, June 19, 2001: US06249904 (99 worldwide citation)

The present invention beneficially provides an improved method and apparatus for designing submicron integrated circuits. A tag identifier is provided to an integrated circuit (IC) design. The tag identifier defines properties for edge fragments in the IC design having edge placement distortion due ...


2
Cobb Nicolas Bailey: Improved method and apparatus for submicron ic design using edge fragment tagging to correct edge placement distortion. Mentor Graphics, October 7, 2004: JP2004-280121 (1 worldwide citation)

PROBLEM TO BE SOLVED: To selectively employ rule-based OPC (optical and process correction) and model-based OPC at a feature level in an efficient manner.SOLUTION: The present invention beneficially provides an improved method and apparatus for designing submicron integrated circuits. A tag identifi ...


3
Cobb Nicolas Bailey: Improved method and apparatus for submicron ic design using edge fragment tagging to correct edge placement distortion. Mentor Graphics Corporation, sAUYEUNG Aloysius T C, November 9, 2000: WO/2000/067076

The present invention beneficially provides an improved method and apparatus for designing submicron integrated circuits. A tag identifier is provided to an integrated circuit (IC) design. The tag identifier defines properties for edge fragments in the IC design having edge placement distortion due ...