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Loopstra Erik Roelof: Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement. Asm Lithography, July 21, 2000: TW399145

In a lithographic projection apparatus, a time-saving height measurement method is used. While in a projection station (105, 108, 111) the pattern of a mask (129) is projected on the fields of a first substrate (120), the height of the fields of a second substrate (121) is measured in a measuring st ...


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