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Levinson Harry J: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, Levinson Harry J, sCOLLOPY Daniel R, February 24, 2005: WO/2005/017625 (351 worldwide citation)

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (22) for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state t ...


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Harry J Levinson: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, Renner Otto Boisselle & Sklar, February 28, 2006: US07006209 (16 worldwide citation)

A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium. The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and determines if th ...


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Harry J Levinson: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, Renner Otto Boisselle & Sklar, June 13, 2006: US07061578 (15 worldwide citation)

A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptab ...


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Levinson Harry J: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, May 10, 2006: EP1654593-A2

A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptab ...


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Harry J Levinson: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Renner Otto Boisselle & Sklar, January 27, 2005: US20050018208-A1

A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium. The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and determines if th ...


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Harry J Levinson: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Renner Otto Boisselle & Sklar, February 17, 2005: US20050037269-A1

A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptab ...


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Levinson Harry J: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, ge bo cheng wei, August 16, 2006: CN200480019532

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (24). The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and d ...


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Levinson Harry J: Method and apparatus for monitoring and controlling imaging in immersion lithography systems. Advanced Micro Devices, cheng wei wang jinyang, August 30, 2006: CN200480020864

A method of monitoring an immersion lithography system (10) in which a wafer (12) can be immersed in a liquid immersion medium (22) for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state t ...


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