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Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, August 24, 2004: US06781673 (17 worldwide citation)

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...


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Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. Asm Lithography, Steven I Weisburd, Dickstein Shapiro Morin & Oshinsky, July 25, 2002: US20020096647-A1

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield means are fixed to the mask holder r ...


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Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. Pillsbury Winthrop, August 15, 2002: US20020109828-A1

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...


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Moors Johannes Hubertus Josephina, Banine Vadim Yevgenyevich, Leenders Martinus Hendrikus Antonius, Werij Henri Gerard Cato, Visser Hugo Matthieu: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. Asml Netherlands, September 1, 2003: TW550659

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield means are fixed to the mask holder r ...


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