1
Sachiko Kobayashi, Taiga Uno, Kazuko Yamamoto, Koji Hashimoto: Mask data design method. Kabushiki Kaisha Toshiba, Finnegan Henderson Farabow Garrett & Dunner L, June 5, 2001: US06243855 (89 worldwide citation)

A correction target segment extracted from the design pattern is divided into lengths suited for correction. If the arrangement of the divided segments is a one-dimensional pattern, a correction value is obtained by conducting a one-dimensional process simulation to an arrangement within a predeterm ...


2
Kobayashi Sachiko, Uno Taiga, Yamamoto Kazuko, Hashimoto Koji: Mask data design method. Toshiba, June 22, 1999: JP1999-168065

PROBLEM TO BE SOLVED: To obtain at high speed and with high precision mask data for which optical proximity effect correction is performed. SOLUTION: This mask data design method though which a design pattern is corrected and used as mask data is provided with a process, in which a line segment to b ...