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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus and particle barrier for use therein. ASML Netherlands, Pillsbury Winthrop, January 4, 2005: US06838684 (44 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to t ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus and particle barrier for use therein. Asml Netherlands, Pillsbury Winthrop, June 10, 2004: US20040108465-A1

A lithographic projection apparatus for EUV lithography includes a foil trap. The foil trap forms an open structure after the EUV source to let the EUV radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to t ...