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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, June 6, 2006: US07057190 (27 worldwide citation)

A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse tra ...


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Levinus Pieter Bakker, Frank Jeroen Pieter Schuurmans, Vadim Yevgenyevich Banine: Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby. Asmlnetherlands, Pillsbury Winthrop, May 12, 2005: US20050098741-A1

A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse tra ...