1
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital&apos evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, September 2, 2003: US06614505 (39 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


2
Christianus Gerardus Maria de Mol, Thomas Josephus Maria Castenmiller, Marcel van Dijk, Franciscus Antonius Chrysogonus Marie Commissaris, Simon de Groot, Catharina Johanna Lucia Maria van den Enden: Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby. ASM Lithography, Pillsbury Winthrop, May 13, 2003: US06563564 (25 worldwide citation)

The present invention provides a method of operating a lithographic projection apparatus including calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; and adjusting the lithographic ...


3
Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Martinus Hendrikus Antonius Leenders, Henri Gerard Cato Werij, Hugo Matthieu Visser, Gerrit Jan Heerens, Erik Leonardus Ham, Hans Meiling, Erik Roelof Loopstra, Sjoerd Nicolaas Lambertus Donders: Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, August 24, 2004: US06781673 (17 worldwide citation)

In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather t ...


4
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, December 7, 2004: US06828569 (14 worldwide citation)

Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected fro ...


5
De Mol Christianus Gerardus Maria, Castenmiller Thomas Josephus Maria, Van Dijk Marcel, Commissaris Franciscus Antonius Chrysogonus Marie, de Groot Simon: Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby. Asm Lithography, September 1, 2002: TW500987 (5 worldwide citation)

The present invention provides a method of operating a lithographic projection apparatus, the method by comprising the steps of: calculating a change in aberration effect in the projection system, due to heating effects, as a function of time, based on at least one set of predetermined parameters; a ...


6
Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 3, 2006: US07115886 (2 worldwide citation)

In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the ...


7
Vadim Y Banine, Jeroen Jonkers: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Koninklijke Philips Electronics, Pillsbury Winthrop Shaw Pittman, March 2, 2010: US07671965 (1 worldwide citation)

A lithographic projection apparatus comprising a radiation system for supplying a projection beam of electromagnetic radiation in the extreme ultraviolet (EUV) range, a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to ...


8
Vadim Y Banine, Jeroen Jonkers: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, March 30, 2004: US06714279 (1 worldwide citation)

A lithographic projection apparatus comprising a radiation system for supplying a projection beam of radiation, a mask table for holding a mask, a substrate table for holding a substrate and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. Eit ...


9
Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital aposevitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine: Lithographic projection apparatus, device manufacturing method, and device manufactured thereby. Asml Netherlands, Pillsbury Winthrop, October 24, 2002: US20020154279-A1 (1 worldwide citation)

Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge g ...


10
Banine Vadim Yevgenyevich, Jonkers Jeroen: Lithographic projection apparatus, device manufacturing method and device manufactured thereby. Asm Lithography, Koninklijke Philips Electronics, August 21, 2003: TW548524 (1 worldwide citation)

A lithographic projection apparatus comprising a radiation system for supplying a projection beam of electromagnetic radiation in the extreme ultraviolet (EUV) range, a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desir ...