1
Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic apparatus and method. Asml Netherlands, Tno, de Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria, ROBERTS Peter David, May 14, 2009: WO/2009/060294 (1 worldwide citation)

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation ...


2
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Marcus Theodoor Wilhelmus Van Der Heijden, Erwin Rinaldo Meinders, Mária Péter: Lithographic apparatus and method. Tno, ASML Netherlands, November 8, 2012: US20120281192-A1

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after th ...


3
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 14, 2007: US07256871 (88 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


4
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 6, 2007: US07292312 (84 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


5
Willem Herman Gertruda Anna Koenen, Arthur Winfried Eduardus Minnaert, Luberthus Ouwehand, Johannes Mathias Theodorus Antonius Adriens, Wouter Onno Pril: Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 19, 2008: US07333174 (82 worldwide citation)

A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substra ...


6
Steven George Hansen: Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 18, 2006: US07030966 (62 worldwide citation)

A method for optimizing the illumination conditions of a lithographic apparatus by computer simulation, the lithographic apparatus including an illuminator and a projection system, includes defining a lithographic pattern to be printed on the substrate, selecting a simulation model, selecting a grid ...


7
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, August 5, 2008: US07408655 (47 worldwide citation)

Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of t ...


8
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, May 5, 2009: US07528965 (46 worldwide citation)

A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at ...


9
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, February 1, 2011: US07880901 (43 worldwide citation)

A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; ...


10
Erik Roelof Loopstra, Leon Martin Levasier, Rene Oesterholt: Lithographic apparatus and method for calibrating the same. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 28, 2010: US07859686 (43 worldwide citation)

A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at ...