1
Van, Santen Helmar, Kolesnychenko Aleksey Yurievich: Lithographic apparatus and device manufacturing method. Asml Netherlands, Van, Santen Helmar, Kolesnychenko Aleksey Yurievich, LEEMING John Gerard, July 14, 2005: WO/2005/064405 (434 worldwide citation)

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the s ...


2
Streefkerk Bob, Baselmans Johannes Jacobus Matheus, Graupner Paul, Haisma Jan, Hattu Nicodemus, Hoogendam Christaan Alexander, Loopstra Erik Roelof, Mulkens Johannes Catharinus Hubertus, Gellrich Bernard: Lithographic apparatus and device manufacturing method. Asml Netherlands, Carl Zeiss Smt, Streefkerk Bob, Baselmans Johannes Jacobus Matheus, Graupner Paul, Haisma Jan, Hattu Nicodemus, Hoogendam Christaan Alexander, Loopstra Erik Roelof, Mulkens Johannes Catharinus Hubertus, Gellrich Bernard, LEEMING John Gerard, June 16, 2005: WO/2005/054955 (384 worldwide citation)

The joint between the lens (21) and its support (22) comprises an inorganic layer or a direct bond and is thus liquid tight which prevents deformation by the immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint ...


3
Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 4, 2005: US06952253 (374 worldwide citation)

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.


4
Lof Joeri, Derksen Antonius Theodorus Ann, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Ritsema Roelof Aeilko Siebrand, Simon Klaus, de Smit Joannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Immersion lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420298-A2 (368 worldwide citation)

In a lithographic projection apparatus a seal member (12) surrounds a space between the final element of a projection system and a substrate table of the lithographic projection apparatus. A gas seal (16) is formed between said seal member and the surface of said substrate to contain liquid (11) in ...


5
Lof Joeri, de Smit Joannes Theodor, Ritsema Roelof Aeilko Siebrand, Simon Klaus, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Meijer Hendricus Johannes Mari, Loopstra Erik Roelof: Lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420300-A2 (360 worldwide citation)

A map of the surface of a substrate is generated at a measurement station (30). The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid (10). The substrate is then aligned using, for example, a transmission image sensor and, using the previous ...


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Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Timotheus Franciscus Sengers, Alexander Straaijer, Bob Streefkerk: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, July 11, 2006: US07075616 (230 worldwide citation)

In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, sub ...


8
Kolesnychenko Aleksey Yurievich, Van Der, Werf Jan Evert: Lithographic apparatus and device manufacturing method. Asml Netherlands, Kolesnychenko Aleksey Yurievich, LEEMING John Gerard, January 6, 2005: WO/2005/001572 (184 worldwide citation)

Liquid is supplied to a space between the final element of the projection system and the substrate, but there is a space between the liquid and the substrate. An evanescent field is formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index ...


9
Lof Joeri, Derksen Antonius Theodorus Ann, Hoogendam Christiaan Alexander, Loopstra Erik Roelof, Mulkens Johannes Catharinus Hu, Straaijer Alexander, Streefkerk Bob, Donders Sjoerd Nicolaas Lamber, Mertens Jeroen Johannes Sophia, Sengers Timotheus Franciscus: Immersion lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420299-A2 (169 worldwide citation)

In a lithographic projection apparatus a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member (150) is provided to take the place of the substrate in containing the liquid (11) ...


10
Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erik Roelof Loopstra: Dual stage lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 9, 2007: US07161659 (157 worldwide citation)

The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is ...