1
Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic apparatus and method. Asml Netherlands, Tno, de Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Van Der Heijden Marcus Theodoor Wilhelmus, Meinders Erwin Rinaldo, Peter Maria, ROBERTS Peter David, May 14, 2009: WO/2009/060294 (1 worldwide citation)

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including: directing a beam of radiation at the surface of the flexible substrate; and detecting changes in the intensity distribution of the beam of radiation after the beam of radiation ...


2
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Paulus Wilhelmus Leonardus Van Dijk, Erwin Rinaldo Meinders, Maria Peter: Lithographic method and carrier substrate. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 4, 2011: US08029973

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic ...


3
Erwin Meinders
De Laat Wilhelmus Johannes Maria, Gui Cheng Qun, Giesen Peter Theodorus Maria, Leonardus Van Dijk Paulus Wilhelmus, Meinders Erwin Rinaldo, Peter Maria: Lithographic method and carrier substrate. Asml Netherlands, July 2, 2009: JP2009-147327

PROBLEM TO BE SOLVED: To provide a new lithographic carrier substrate.SOLUTION: A layer of PDMS and curing agent is provided on one side of the carrier substrate. The PDMS and curing agent receive and adhere to a lithographic substrate. Such dimensions can be given to the carrier substrate that the ...


4
Erwin Meinders
Wilhelmus Johannes Maria De Laat, Cheng Qun Gui, Peter Theodorus Maria Giesen, Marcus Theodoor Wilhelmus Van Der Heijden, Erwin Rinaldo Meinders, Mária Péter: Lithographic apparatus and method. Tno, ASML Netherlands, November 8, 2012: US20120281192-A1

A method of obtaining information indicative of the topography of a surface of a flexible substrate, the method including directing a beam of radiation at the surface of the flexible substrate; and detecting changes in intensity distribution, or angle of reflection, of the beam of radiation after th ...


5
Erwin Meinders
Wilhelmus Johannes Maria DE LAAT, Cheng Qun GUI, Peter Theodorus Maria GIESEN, Paulus Wilhelmus Leonardus VAN DIJK, Erwin Rinaldo MEINDERS, Maria PETER: Lithographic method and carrier substrate. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, July 2, 2009: US20090170025-A1

A carrier substrate is provided with a layer of PDMS and curing agent on one side of the carrier substrate. The PDMS and curing agent can be arranged to receive and adhere to a lithographic substrate. The carrier substrate can be dimensioned such that the combined carrier substrate and lithographic ...


6
Van, Santen Helmar, Kolesnychenko Aleksey Yurievich: Lithographic apparatus and device manufacturing method. Asml Netherlands, Van, Santen Helmar, Kolesnychenko Aleksey Yurievich, LEEMING John Gerard, July 14, 2005: WO/2005/064405 (434 worldwide citation)

A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the s ...


7
Streefkerk Bob, Baselmans Johannes Jacobus Matheus, Graupner Paul, Haisma Jan, Hattu Nicodemus, Hoogendam Christaan Alexander, Loopstra Erik Roelof, Mulkens Johannes Catharinus Hubertus, Gellrich Bernard: Lithographic apparatus and device manufacturing method. Asml Netherlands, Carl Zeiss Smt, Streefkerk Bob, Baselmans Johannes Jacobus Matheus, Graupner Paul, Haisma Jan, Hattu Nicodemus, Hoogendam Christaan Alexander, Loopstra Erik Roelof, Mulkens Johannes Catharinus Hubertus, Gellrich Bernard, LEEMING John Gerard, June 16, 2005: WO/2005/054955 (384 worldwide citation)

The joint between the lens (21) and its support (22) comprises an inorganic layer or a direct bond and is thus liquid tight which prevents deformation by the immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint ...


8
Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen: Lithographic apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 4, 2005: US06952253 (374 worldwide citation)

In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.


9
Lof Joeri, Derksen Antonius Theodorus Ann, Hoogendam Christiaan Alexander, Kolesnychenko Aleksey, Loopstra Erik Roelof, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Ritsema Roelof Aeilko Siebrand, Simon Klaus, de Smit Joannes Theodoor, Straaijer Alexander, Streefkerk Bob, Van Santen Helmar: Immersion lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420298-A2 (368 worldwide citation)

In a lithographic projection apparatus a seal member (12) surrounds a space between the final element of a projection system and a substrate table of the lithographic projection apparatus. A gas seal (16) is formed between said seal member and the surface of said substrate to contain liquid (11) in ...


10
Lof Joeri, de Smit Joannes Theodor, Ritsema Roelof Aeilko Siebrand, Simon Klaus, Modderman Theodorus Marinus, Mulkens Johannes Catharinus Hu, Meijer Hendricus Johannes Mari, Loopstra Erik Roelof: Lithographic apparatus and device manufacturing method. Asml Netherlands, May 19, 2004: EP1420300-A2 (360 worldwide citation)

A map of the surface of a substrate is generated at a measurement station (30). The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid (10). The substrate is then aligned using, for example, a transmission image sensor and, using the previous ...