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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Cornelis Petrus Andreas Maria Luijkx, Frank Jeroen Pieter Schuurmans: Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 11, 2007: US07307263 (35 worldwide citation)

A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patter ...


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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Cornelis Petrus Andreas Maria Luijkx, Frank Jeroen Pieter Schuurmans: Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, January 19, 2006: US20060012761-A1

A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patter ...


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Levinus Pieter Bakker, Banine Vadim Yevgenyevich, Luijkx Cornelis Petrus A M, Schuurmans Frank Jeroen Pieter: Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in contaminant trap. Asml Netherlands, May 14, 2009: JP2009-105442

PROBLEM TO BE SOLVED: To provide a lithographic apparatus including: a radiation system which includes a supply source for generating a radiation beam, a contaminant trap located in a path of the radiation beam, and an illumination system constituted so as to adjust the radiation beam generated by t ...