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Yim Bun Patrick Kwan: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherland, Pillsbury Winthrop, November 16, 2004: US06819425 (107 worldwide citation)

The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the ...


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Arie Jeffrey Den Boef, Maarten Hoogerland, Boguslaw Gajdeczko: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, November 1, 2005: US06961116 (51 worldwide citation)

An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment markers. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the ...


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Mark Kroon, Michael Cornelis Van Beek, Peter Dirksen, Ralph Kurt, Cassandra May Owen: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, December 5, 2006: US07145641 (40 worldwide citation)

A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also ...


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Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Hugo Augustinus Joseph Cramer, Jozef Maria Finders, Carsten Kohler: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, October 26, 2004: US06809797 (35 worldwide citation)

A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis ...


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Markus Franciscus Antonius Eurlings, Noud Jan Gilissen: Lithographic apparatus, device manufacturing method and device manufactured thereby, control system. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, March 21, 2006: US07015491 (32 worldwide citation)

A lithographic projection system has an illumination system. A plurality of directing elements direct different sub-beams of an incident beam into predetermined directions. By using re-directing optics any desired angular intensity distribution of the beam can be produced. The illumination system in ...


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Pieter Willem Herman de Jager, Pieter Kruit, Arno Jan Bleeker, Karel Diederick van der Mast: Lithographic apparatus, device manufacturing method, and device manufactured thereby. Shirley L Church, October 14, 2003: US06633366 (26 worldwide citation)

Various options for improving throughput in an e-beam lithography apparatus are described. A slider lens moves in synchronism with the scanning motion of the electron beam.


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Jan Jaap Krikke, Markus Franciscus Antonius Eurlings, Jan Hoegee, Paul van der Veen: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, June 24, 2003: US06583855 (21 worldwide citation)

A lithographic projection system has an optical element provided in the illumination system for changing an elliptically symmetric intensity anomaly of the projection beam in a pupil of the projection apparatus, the optical element being rotated about the optical axis of the projection apparatus suc ...


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Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Ralph Kurt, Frank Jeroen Pieter Schuurmans, Yurii Victorovitch Sidelnikov: Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, April 25, 2006: US07034308 (19 worldwide citation)

A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the ...


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Johannes Catharinus Hubertus Mulkens, Marco Hugo Petrus Moers: Lithographic apparatus, device manufacturing method, and device manufactured thereby. ASML Netherlands, Pillsbury Winthrop, November 16, 2004: US06819405 (18 worldwide citation)

A lithographic projection apparatus including a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patterning structure, ...