1
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, November 21, 2017: US09823583 (1 worldwide citation)

A liquid immersion member used in a liquid immersion exposure apparatus, and is capable of forming liquid immersion space on a surface of an object opposite to an emitting surface of optical member which emits exposure light. Liquid immersion member includes a first member that includes a first part ...


2
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, May 16, 2017: US09651873 (1 worldwide citation)

A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part ...


3
Shinji Sato: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, October 9, 2018: US10095127

A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting surface of an optical member. The liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening th ...


4
Shinji Sato, Kenyo Odanaka: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, November 21, 2017: US09823582

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical memb ...


5
Shinji Sato, Kenyo Odanaka: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, November 20, 2018: US10133189

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical memb ...


6
Shinji Sato, Kenyou Odanaka: Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium. NIKON CORPORATION, Oliff, August 1, 2017: US09720331

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical memb ...


7
LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM. September 25, 2014: US20140285781-A1

A liquid immersion member used in an immersion exposure apparatus, and capable of forming a liquid immersion space on a surface of an object opposite to an emitting surface of an optical member which emits exposure light. The liquid immersion member includes a first member that includes a first part ...


8
LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM. October 9, 2014: US20140300875-A1

A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical memb ...


9
LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM. March 17, 2016: US20160077447-A1

A liquid immersion member used in a liquid immersion exposure apparatus, and is capable of forming liquid immersion space on a surface of an object opposite to an emitting surface of optical member which emits exposure light. Liquid immersion member includes a first member that includes a first part ...


10
LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM. NIKON CORPORATION, February 8, 2018: US20180039189-A1

A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting surface of an optical member. The liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening th ...