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William N Partio, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. Cymer, William C Cray, Cymer, March 7, 2006: US07009140 (25 worldwide citation)

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light ...


2
William N Partlo, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. TCZ, Procopio Cory Hargreaves & Savitch, Noel C Gillespie, February 8, 2011: US07884303 (15 worldwide citation)

A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser out ...


3
William N Partlo, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. TCZ, Procopio Cory Hargreaves & Savitch, Noel C Gillespie, January 29, 2013: US08362391 (14 worldwide citation)

A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser outp ...


4
Partlo William N, Das Palash P, Hudyma Russel, Thomas Michael: Laser thin film poly-silicon annealing optical system. Tcz, August 16, 2006: EP1689552-A2

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser o ...


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William N Partlo, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. Cymer, Legal Department, February 17, 2005: US20050035103-A1

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light ...


7
William N Partlo, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. Matthew K Hillman, Cymer, December 8, 2005: US20050269300-A1

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output ligh ...


8
William N Partlo, Palash P Das, Russell Hudyma, Michael Thomas: Laser thin film poly-silicon annealing optical system. Tcz, July 7, 2011: US20110163077-A1

A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser outp ...


9
Partlo William N, Das Palash P, Hudyma Russel, Thomas Michael: Laser thin film poly-silicon annealing optical system. Tcz, Partlo William N, Das Palash P, Hudyma Russel, Thomas Michael, CRAY William C, June 16, 2005: WO/2005/053893

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser o ...


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Partlo William N, Das Palash P, Hudyma Russell, Thomas Michael: Laser thin film poly-silicon annealing optical system. Tcz, yan shen, December 27, 2006: CN200480035030

A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may comprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output ligh ...