1
Bruce W Worster, Dale E Crane, Hans J Hansen, Christopher R Fairley, Ken K Lee: Laser imaging system for inspection and analysis of sub-micron particles. Ultrapointe Corporation, Alan H MacPherson, Skjerven Morrill MacPherson Franklin & Friel, December 26, 1995: US05479252 (152 worldwide citation)

A laser imaging system is used to analyze defects on semiconductor wafers that have been detected by patterned wafer defect detecting systems (wafer scanners). The laser imaging system replaces optical microscope review stations now utilized in the semiconductor fab environment to examine detected o ...


2
Bruce W Worster, Dale E Crane, Hans J Hansen, Christopher R Fairley, Ken K Lee: Laser imaging system for inspection and analysis of sub-micron particles. Ultrapointe Corporation, Alan H MacPherson, Gary J Edwards, Skjerven Morrill MacPherson Franklin & Friel, October 5, 1999: US05963314 (127 worldwide citation)

A laser imaging system is used to analyze defects on semiconductor wafers that have been detected by patterned wafer defect detecting systems (wafer scanners). The laser imaging system replaces optical microscope review stations now utilized in the semiconductor fab environment to examine detected o ...