1
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, Lyons Christopher F, Babcock Carl P, Kye Jongwook, DRAKE Paul S, July 7, 2005: WO/2005/062128 (354 worldwide citation)

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


2
Christopher F Lyons, Carl P Babcock, Jongwook Kye: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, Renner Otto Boisselle & Sklar, October 24, 2006: US07125652 (5 worldwide citation)

A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted. A conforming immersion medium can be positioned between a photo resist layer and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into int ...


3
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, August 23, 2006: GB2423374-A

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


4
Christopher F Lyons, Carl P Babcock, Jongwook Kye: Immersion lithographic process using a conforming immersion medium. Renner Otto Boisselle & Sklar, June 9, 2005: US20050122497-A1

A method of making a device using a lithographic system having a lens from which an exposure pattern is emitted. A conforming immersion medium can be positioned between a photo resist layer and the lens. The photo resist layer, which can be disposed over a wafer, and the lens can be brought into int ...


5
Lyons Christopher F, Babcock Carl P, Kye Jongwook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, ge bo cheng wei, December 27, 2006: CN200480035404

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


6
Lyons Christopher F, Babcock Carl P, Kye Jong Wook: Immersion lithographic process using a conforming immersion medium. Advanced Micro Devices, December 1, 2006: KR1020067011092

A method of making a device using a lithographic system (10) having a lens (32) from which an exposure pattern (24) is emitted. A conforming immersion medium (26) can be positioned between a photo resist layer (34) and the lens. The photo resist layer, which can be disposed over a wafer, and the len ...


7

8

9


Click the thumbnails below to visualize the patent trend.