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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, January 1, 2013: US08345218 (8 worldwide citation)

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


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Michel Riepen, Nicolaas Rudolf Kemper, Johannes Petrus Martinus Bernardus Vermeulen, Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Arnold Jan Van Putten: Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method. Asml Netherlands, Pillsbury Winthrop Shaw Pittman, November 12, 2009: US20090279063-A1

An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning devic ...


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