1
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, September 17, 2002: US06452661 (65 worldwide citation)

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (


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Komatsuda Hideki: Illumination system and exposure apparatus and method. Nippon Kogaku, September 1, 1999: EP0939341-A2 (54 worldwide citation)

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises ...


3
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, December 16, 2003: US06665051 (4 worldwide citation)

An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path betwe ...


4
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berrige, April 4, 2006: US07023953 (3 worldwide citation)

An optical apparatus and method guide EUV radiation to a predetermined surface. A radiation source supplies EUV radiation having a certain dispersion angle. An illumination optical system having a reflective integrator forms a secondary radiation source having a predetermined shape based on the EUV ...


5
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, May 6, 2004: US20040085645-A1

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises ...


6
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, May 6, 2004: US20040084632-A1

An optical apparatus and method guide EUV radiation to a predetermined surface. A radiation source supplies EUV radiation having a certain dispersion angle. An illumination optical system having a reflective integrator forms a secondary radiation source having a predetermined shape based on the EUV ...


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Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, May 13, 2004: US20040090609-A1

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises ...


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Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, July 25, 2002: US20020097387-A1

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises ...


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Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, December 19, 2002: US20020191170-A1

An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path betwe ...


10
Hideki Komatsuda: Illumination system and exposure apparatus and method. Nikon Corporation, Oliff & Berridge, July 18, 2002: US20020093636-A1

An illumination system and exposure apparatus and method involving illuminating a surface over an illumination field (IF) having an arcuate shape. The illumination system comprises a light source (54) for providing a light beam (100), and an optical integrator (56). The optical integrator comprises ...