1
Susumu Mori, Tsuyoshi Naraki: Scanning light exposure apparatus. Nikon Corporation, Shapiro and Shapiro, November 26, 1996: US05579147 (239 worldwide citation)

A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the ...


2
Hisashi Nishinaga: Exposure apparatus and exposure method capable of controlling illumination distribution. Nikon Corporation, Oliff & Berridge, August 3, 2004: US06771350 (111 worldwide citation)

An exposure apparatus radiates an exposure light beam from an exposure light source onto a reticle via an illumination optical system including a first fly's eye lens, a second fly's eye lens, a lens system, a blind, and a condenser lens system, and it projects an image of a pattern on the ...


3
Tanitsu Osamu, Tanaka Hirohisa, Muramatsu Kenichi, Komine Norio, Nishinaga Hisashi, Matsuyama Tomoyuki, Kudo Takehito: (Ja) 照明光学装置、露光装置および露光方法, (En) Illumination optical system, exposure system, and exposure method. Nikon Corporation, Tanitsu Osamu, Tanaka Hirohisa, Muramatsu Kenichi, Komine Norio, Nishinaga Hisashi, Matsuyama Tomoyuki, Kudo Takehito, YAMAGUCHI Takao, June 17, 2004: WO/2004/051717 (109 worldwide citation)

(EN) An illumination optical system for, when installed in an exposure system, realizing an adequate illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of light. The illumina ...


4
Toshiharu Nakashima, Masato Hamatani, Ken Ozawa: Scanning exposure apparatus. Nikon Corporation, Shapiro and Shapiro, July 9, 1996: US05534970 (106 worldwide citation)

A projection exposure apparatus for transferring a pattern formed on a mask onto a photosensitive substrate by a scanning exposure method, includes a light source for generating a light beam having a predetermined spatial coherence, an illumination optical system for receiving the light beam from th ...


5
Kenji Nishi, Shinji Wakamoto: Scanning exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, January 7, 1997: US05591958 (100 worldwide citation)

An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substr ...


6
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


7
Katsumi Kurematsu, Shigeru Oshima, Nobuo Minoura: Multicolor projector employing diffraction grating type liquid crystal light modulators. Canon Kabushiki Kaisha, August 17, 1993: US05237435 (93 worldwide citation)

A projector capable of compactizing the structure and improving the efficiency of light utilization is disclosed. The projector has an illuminating system, a light modulation device and a projection optical system. A first and a second lights of mutually different colors are emitted from the illumin ...


8
Yoshitada Oshida, Yasuhiko Nakayama, Masahiro Watanabe, Minoru Yoshida, Kenichirou Fukuda: Method and apparatus for pattern exposure, mask used therefor, and semiconductor integrated circuit produced by using them. Hitachi, Antonelli Terry Stout & Kraus, October 14, 1997: US05677755 (92 worldwide citation)

A pattern exposure method including the steps of irradiating a mask or reticle having a desired original pattern written thereon with light with a desired directivity from an illuminating light source for exposure, and projecting a transmitted or reflected light from said mask to an object to be exp ...


9
Akira Miyaji, Masatoshi Ikeda: Exposure apparatus. Nikon Corporation, Shapiro and Shapiro, September 24, 1996: US05559584 (90 worldwide citation)

An exposure apparatus is for illuminating a pattern on a mask by an illumination optical system to transfer the pattern on the mask onto a photosensitive substrate set on a stage through a projection optical system. The exposure apparatus comprises a first supply device for supplying an inert gas to ...


10
Makoto Uehara, Takeshi Sudo, Fujio Kanatani: Horizontal position detecting device. Nippon Kogaku, Fitzpatrick Cella Harper & Scinto, December 17, 1985: US04558949 (90 worldwide citation)

Disclosed is a horizontal position detecting device for maintaining the surface of a body to be inspected vertically to the optical axis of a main objective lens. The device includes an illumination optical system and a condenser lens system. The illumination optical system supplies parallel light r ...