1
Jun Zhao, Talex Sajoto, Leonid Selyutin: Heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, Townsend and Townsend and Crew, January 30, 2001: US06179924 (129 worldwide citation)

The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


2
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, March 7, 2001: EP1080485-A1

The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


3
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, BERNADICOU Michael A, November 4, 1999: WO/1999/056307

The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...


4
Zhao Jun, Sajoto Talex, Selyutin Leonid: Improved heater for use in substrate processing apparatus to deposit tungsten. Applied Materials, May 25, 2001: KR1020007011915

The present invention provides a simplified heater design that is scaleable for equipment processing different diameter substrates and that can efficiently and economically process substrates to meet stringent film requirements such as film uniformity for fabricating high integration devices. The pr ...



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