1
Martin E Lee: Guideless stage with isolated reaction stage. Nikon Precision, Norman R Klivans, Skjerven Morrill MacPherson Franklin & Friel, June 18, 1996: US05528118 (425 worldwide citation)

A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at lea ...


2
Martin E Lee: Guideless stage with isolated reaction stage. Nikon Corporation, Oliff & Berridge, January 11, 2005: US06841965 (90 worldwide citation)

A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at lea ...


3
Lee Martin E: Guideless stage with isolated reaction stage. Nikon Precision, October 11, 1995: GB2288277-A (20 worldwide citation)

A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame (61, 62) is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage (30) is disclosed for move ...


4
Martin E Lee: Guideless stage with isolated reaction stage. Nikon Corporation, Oliff & Berridge, October 18, 2001: US20010030522-A1

A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at lea ...