1
Donis Flagello, John Doering: Gradient immersion lithography. ASML Netherlands, Pillsbury Winthrop Shaw Pittman, October 11, 2005: US06954256 (183 worldwide citation)

In a lithographic projection apparatus, a space between an optical element is filled with a first fluid and a second fluid separated by a transparent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one another. The first fluid is ...


2
Donis Flagello, John Doering: Gradient immersion lithography. ASML Netherlands, Pillsbury Winthrop, May 5, 2005: US20050094116-A1

In a lithographic projection apparatus, a space between an optical element of a projection system is filled with a first fluid and a second fluid separated by a translucent plate. The first and second fluids have first and second indices of refraction, respectively, that are different from one anoth ...


3
Wei Cheng SHIU: Immersion lithographic apparatuses. Nanya Technology Corporation, September 15, 2011: US20110222030-A1

Apparatuses for specially designed gradient immersion lithography are presented. The gradient immersion lithographic apparatus includes a radiation system providing a patterned beam of radiation, a substrate table with a substrate structure held thereon, a projection system with an optical lens elem ...