1
Yasuyuki Sakakibara, Yasuaki Tanaka, Seiro Murakami, Kenji Nishi: Exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, September 5, 1995: US05448332 (326 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...


2
Yasuaki Tanaka, Seiro Murakami, Kenji Nishi: Exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, August 19, 2003: US06608681 (123 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...


3
Kenji Nishi, Shinji Wakamoto: Scanning exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, January 7, 1997: US05591958 (100 worldwide citation)

An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substr ...


4
Tsuneo Miyai, Yuji Imai, Tetsuo Taniguchi, Kousuke Suzuki: Thermal distortion compensated projection exposure method and apparatus for manufacturing semiconductors. Nikon Corporation, Shapiro and Shapiro, December 3, 1996: US05581324 (93 worldwide citation)

A projection exposure apparatus has a light source for emitting illumination light, an illumination optical system for illuminating a mask, on which a predetermined pattern is formed, with the illumination light, and a projection optical system for forming an image of the pattern on a photosensitive ...


5
Toshihiko Ozawa, Masaya Komatsu, Masato Shibuya, Hiroshi Ooki, Masaomi Kameyama, Yoshifumi Tokoyoda: Exposure method and apparatus. Nikon Corporation, Pennie & Edmonds, April 14, 1998: US05739898 (89 worldwide citation)

The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective ...


6
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, June 11, 2002: US06404482 (89 worldwide citation)

In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming be ...


7
Naomasa Shiraishi: Projection exposure method and apparatus. Nikon Corporation, Oliff & Berridge, April 3, 2001: US06211944 (84 worldwide citation)

A projection exposure apparatus and method that includes an illumination system and a projection system. The illumination system may include a plurality of optical integrators that form different secondary light sources. The illumination system illuminates the pattern with light from a secondary lig ...


8
Yasuaki Tanaka, Seiro Murakami, Kenji Nishi: Exposure method and apparatus. Nikon Corporation, Shapiro and Shapiro, December 2, 1997: US05693439 (84 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...


9
Kenji Nishi, Yasuaki Tanaka, Seiro Murakami: Exposure method and apparatus. Nikon Corporation, Miles & Stockbridge P C, August 13, 2002: US06433872 (76 worldwide citation)

An apparatus for exposing a pattern, formed on a mask, on each of a plurality of partitioned areas on a photosensitive substrate by a step-and-repeat scheme includes a projection optical system for projecting the pattern of the mask on the photosensitive substrate, a substrate stage for holding the ...


10
Shiraishi Naomasa: Projection exposure method and apparatus.. Nippon Kogaku, May 20, 1992: EP0486316-A2 (72 worldwide citation)

A projection exposure apparatus consists of: an illumination optical system, including a light source, for irradiating a mask; a projection optical system for projecting a hyperfine pattern image on a substrate; an optical integrator for illuminating the mask in a homogeneous illuminance distributio ...