1
Martin E Lee: Exposure apparatus having dynamically isolated reaction frame. Nikon Corporation, Oliff & Berridge, December 28, 1999: US06008500 (103 worldwide citation)

A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils o ...


2
Martin E Lee: Exposure apparatus having dynamically isolated reaction frame. Nikon Corporation, Oliff & Berridge, November 21, 2000: US06150787 (94 worldwide citation)

A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils o ...


3
Martin E Lee: Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame. Nikon Corporation, Oliff & Berridge, February 1, 2000: US06020710 (94 worldwide citation)

A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils o ...


4
Martin E Lee: Exposure apparatus having dynamically isolated reaction frame. Nikon Corporation, Oliff & Berridge, January 16, 2001: US06175404 (92 worldwide citation)

An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a movable mask stage to hold the mask and a movable object stage to hold the object. The apparatus also includes a r ...


5
Martin E Lee: Exposure method, and method of making exposure apparatus having dynamically isolated reaction frame. Nikon Corporation, Oliff & Berridge, July 11, 2000: US06087797 (92 worldwide citation)

A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils o ...