1
Hideo Mizutani, Nobutaka Magome: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, December 2, 2008: US07460207 (86 worldwide citation)

An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid ...


2
Hideo Mizutani, Nobutaka Magome: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, October 14, 2008: US07436487 (76 worldwide citation)

An exposure apparatus performs an exposure of a substrate by filling at least a portion of the space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate via the projection optical system and the liquid. The apparatus includes a ...


3
Hideo Mizutani, Nobutaka Magome: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, May 27, 2008: US07379158 (76 worldwide citation)

A liquid immersion type exposure apparatus includes a projection optical system for projecting a pattern of a mask onto a substrate, a liquid film forming system for forming a liquid film in a predetermined region between the projection optical system and the substrate, and a sensor for detecting di ...


4
Naoyuki Kobayashi, Akikazu Tanimoto, Yasushi Mizuno, Kenichi Shiraishi, Katsushi Nakano, Soichi Owa: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, June 17, 2008: US07388649 (69 worldwide citation)

There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the subst ...


5
Sato Kei, Horiuchi Takashi: (Ja) 基板搬送装置、露光装置、並びにデバイス製造方法, (En) Substrate carrying apparatus, exposure apparatus, and method for producing device. Zao Nikon, Nikon Corporation, Sato Kei, Horiuchi Takashi, SHIGA Masatake, April 21, 2005: WO/2005/036622 (60 worldwide citation)

(EN) A substrate carrying apparatus comprises a first carrying mechanism for carrying a substrate into an exposure unit where an exposure is conducted via a projection optical system and a liquid, a second carrying mechanism for carrying the substrate out of the exposure unit, and an anti-scattering ...


6
Shigeru Hirukawa: Exposure method, exposure apparatus, and method for producing device. Nikon Corporation, Oliff & Berridge, January 27, 2009: US07483117 (38 worldwide citation)

An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern ...


7
Masahiro Nei, Naoyuki Kobayashi, Dai Arai, Soichi Owa: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, September 15, 2009: US07589820 (37 worldwide citation)

An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery ...


8
Hiroyuki Nagaksaka: Exposure method, exposure apparatus, and method for producing device. Nikon Corporation, Oliff & Berridge, February 24, 2009: US07495744 (26 worldwide citation)

When exposing a substrate by projecting a pattern image onto the substrate via a projection optical system (PL) and liquid (1), an exposure method includes a determination of a liquid immersion condition to be performed to the substrate, such as a liquid type, depending on a film (SP) formed as a li ...


9
Hiroyuki Nagasaka: Exposure method, exposure apparatus, and method for producing device. Nikon Corporation, Oliff & Berridge, July 15, 2008: US07399979 (24 worldwide citation)

An exposure system includes an exposure part for irradiating a resist film formed on a substrate with exposing light through a mask with a liquid provided on the resist film. The system also includes a liquid supply part for supplying the liquid to the exposure part. The liquid supply part includes ...


10
Masahiro Nei, Naoyuki Kobayashi, Hiroshi Chiba, Shigeru Hirukawa: Exposure apparatus and method for producing device. Nikon Corporation, Oliff & Berridge, July 10, 2007: US07242455 (15 worldwide citation)

An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrat ...